Large-Area Dual-Beam Interference Exposure System-Technology-Suzhou Zhongde Photonics Technology Co., Ltd.

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Suzhou Zhongde Photonics Technology Co., Ltd.

Technology

Large-Area Dual-Beam Interference Exposure System

Large-Area LCPG Holographic Projection Lens Exposure System

Large-Area Laser-Direct-Writing Exposure System

Large-Area LC Polymer Film Alignment Technologies

Gratings Mass Duplication Technology

Holographic Light Diffusion Film

LCOS digital PGU

Proximity interference PA system

Photoalignment equipment for large area PVG:
• Gratings pitch:＞400nm
• Gratings dimension: ~200mm
• Seam size: ≤5μm
• Gratings type: uniform gratings, pixelated gratings

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