Large-Area Laser-Direct-Writing Exposure System-Technology-Suzhou Zhongde Photonics Technology Co., Ltd.

中文 | EN

Suzhou Zhongde Photonics Technology Co., Ltd.

Technology

Large-Area Dual-Beam Interference Exposure System

Large-Area LCPG Holographic Projection Lens Exposure System

Large-Area Laser-Direct-Writing Exposure System

Large-Area LC Polymer Film Alignment Technologies

Gratings Mass Duplication Technology

Holographic Light Diffusion Film

LCOS digital PGU


LDW photoalignment equip	Optical imprint system

       LC DOE photoalignment equipment:
   • Feature size: ＜1μm
   • Film dimension:＞200mm
   • Number of phase orders: 2-16
   • Mask + duplication capability，mass production

Inquiry
Intention To Cooperate